|Statement||edited by Carroll F. Powell, Joseph H. Oxley and John M. Blocher, Jr. ; sponsored by the Electrochemical Society, New York.|
|Series||Electrochemical Society series|
|Contributions||Oxley, Joseph H., Blocher, John Milton, 1891-, Battelle Memorial Institute. Vapor-plating, Electrochemical Society|
|The Physical Object|
|Pagination||xiv, 725 p. :|
|Number of Pages||725|
|LC Control Number||66-13515|
Introduction to Chemical Vapor Deposition (CVD) J. R. Creighton and P. Ho Sandia National Laboratories P.O. Box , MS Albuquerque, NM Introduction Chemical vapor deposition (CVD) is a widely used materials-processing technology. The majority of its applications involve applying solid thin-film coatings to surfaces, but it is also. : vapor deposition. Skip to main content. Try Prime All Go Search EN Hello, Sign in Account & Lists Sign in Account & Lists Orders Try Prime Cart. Today's Deals Your Gift Cards Help. A unified treatment of the theories, data, and technologies underlying physical vapor deposition methods With electronic, optical, and magnetic coating technologies increasingly dominating manufacturing in the high-tech industries, there is a growing need for expertise in physical vapor deposition of thin by: Physical vapor deposition (PVD), sometimes (especially in single-crystal growth contexts) called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings. PVD is characterized by a process in which the material goes from a condensed phase to a vapor phase and then back to a thin film condensed phase.
Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high quality, high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films.. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired . The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology. This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Don has published numerous papers and book chapters on the subject of Physical Vapor Deposition (PVD) processing and technology transfer from R&D to production. He is the author of Handbook of Physical Vapor Deposition (PVD) Processing (1st edition , 2nd edition ) published by Elsevier and Foundations of Vacuum Coating Technology. A unified treatment of the theories, data, and technologies underlying physical vapor deposition methods With electronic, optical, and magnetic coating technologies increasingly dominating manufacturing in the high-tech industries, there is a growing need for expertise in physical vapor deposition of thin films. This important new work provides researchers and Cited by:
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